KANEKO Laboratory

Research Organization of Science and Technology

Ritsumeikan University

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(日本語) ミストCVD法を用いたSi基板上Ga2O3成長に関する論文が日本材料学会会誌「材料」2022年10月号へ掲載されました。 (リンク先:
https://www.jstage.jst.go.jp/article/jsms/71/10/71_835/_article/-char/ja)

Sorry, this entry is only available in 日本語.

Kaneko Laboratory
Research Organization of Science and Technology Ritsumeikan University

1-1-1 Noji-higashi, Kusatsu-shi, Shiga 525-8577
Biwako Kusatsu Campus, Ritsumeikan University
High Technology Research Center Room 141, Room 143 (Kaneko Lab. students’ room, laboratory)
Room 107, Disaster Prevention System Research Center (Kaneko’s room)

 
Please contact us by e-mail at the address below. ※((at) = @)

E-mail: ken0710(at)fc.ritsumei.ac.jp